J. Suñé and E. Y. Wu (Invited book chapter), Defects Associated with Dielectric Breakdown in SiO₂-Based Gate Dielectrics.In: Defects in Microelectronic Materials and Devices, Editors: D.M. Fleetwood, S.T. Pantelides and R.D. Schrimpf.  CRC Press 2009 (Boca Ratón, FL, USA); ISBN: 978-1-4200-4376-1

A. Strong, E. Y. Wu, R.-P. Vollertsen, J. Suñé, G. La Rosa, S. E. Rauch III and T.D. Sullivan (Complete Textbook),Reliability Wearout Mechanisms in Advanced CMOS Technologies, IEEE Press Series on Microelectronic Systems, Wiley-IEEE Press 2009; ISBN 978-0-471-73172-6